Chemical shift tensors and NICS calculations for stable silylenes [11]

R. West; J. J. Buffy; M. Haaf; T. Muller; B. Gehrhus; M. F. Lapper; Yitzhak Apeloig

doi:10.1021/ja9723287

Chemical shift tensors and NICS calculations for stable silylenes [11]

R. West
, J. J. Buffy
, M. Haaf
, T. Muller
, B. Gehrhus
, M. F. Lapper
, Yitzhak Apeloig

Technion - Israel Institute of Technology

Research output: Contribution to journal › Letter › peer-review

Original language	English
Pages (from-to)	1639-1640
Number of pages	2
Journal	Journal of the American Chemical Society
Volume	120
Issue number	7
DOIs	https://doi.org/10.1021/ja9723287
State	Published - 25 Feb 1998

ASJC Scopus subject areas

Catalysis
General Chemistry
Biochemistry
Colloid and Surface Chemistry

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10.1021/ja9723287

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title = "Chemical shift tensors and NICS calculations for stable silylenes [11]",

author = "R. West and Buffy, \{J. J.\} and M. Haaf and T. Muller and B. Gehrhus and Lapper, \{M. F.\} and Yitzhak Apeloig",

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AU - West, R.

AU - Buffy, J. J.

AU - Haaf, M.

AU - Muller, T.

AU - Gehrhus, B.

AU - Lapper, M. F.

AU - Apeloig, Yitzhak

PY - 1998/2/25

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JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 7

ER -

Chemical shift tensors and NICS calculations for stable silylenes [11]

ASJC Scopus subject areas

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