High performance MEMS 0.18μm RF- CMOS inductors

R. Ben Yishay, S. Stolyarova, S. Shapira, Y. Nemirovsky

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This work presents the fabrication and characterization of on-chip micromachined spiral inductors in a commercially available 0.18μm CMOS process provided by TOWER Semiconductors Ltd. It explores the possibility to reduce parasitic effects and extending high frequency performance by applying a maskless micromachining post processing to create fully integrated inductors, suspended over the substrate with inter-turn dielectric removed.
Original languageEnglish
Title of host publication2008 IEEE International Conference on Microwaves, Communications, Antennas and Electronic Systems, COMCAS 2008
DOIs
StatePublished - 2008
Event2008 IEEE International Conference on Microwaves, Communications, Antennas and Electronic Systems, COMCAS 2008 - Tel-Aviv, Israel
Duration: 13 May 200814 May 2008

Publication series

Name2008 IEEE International Conference on Microwaves, Communications, Antennas and Electronic Systems, COMCAS 2008

Conference

Conference2008 IEEE International Conference on Microwaves, Communications, Antennas and Electronic Systems, COMCAS 2008
Country/TerritoryIsrael
CityTel-Aviv
Period13/05/0814/05/08

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Communication

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