TY - GEN
T1 - High performance MEMS 0.18μm RF- CMOS inductors
AU - Yishay, R. Ben
AU - Stolyarova, S.
AU - Shapira, S.
AU - Nemirovsky, Y.
PY - 2008
Y1 - 2008
N2 - This work presents the fabrication and characterization of on-chip micromachined spiral inductors in a commercially available 0.18μm CMOS process provided by TOWER Semiconductors Ltd. It explores the possibility to reduce parasitic effects and extending high frequency performance by applying a maskless micromachining post processing to create fully integrated inductors, suspended over the substrate with inter-turn dielectric removed.
AB - This work presents the fabrication and characterization of on-chip micromachined spiral inductors in a commercially available 0.18μm CMOS process provided by TOWER Semiconductors Ltd. It explores the possibility to reduce parasitic effects and extending high frequency performance by applying a maskless micromachining post processing to create fully integrated inductors, suspended over the substrate with inter-turn dielectric removed.
UR - http://www.scopus.com/inward/record.url?scp=51849136963&partnerID=8YFLogxK
U2 - 10.1109/COMCAS.2008.4562816
DO - 10.1109/COMCAS.2008.4562816
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AN - SCOPUS:51849136963
SN - 1424420970
SN - 9781424420971
T3 - 2008 IEEE International Conference on Microwaves, Communications, Antennas and Electronic Systems, COMCAS 2008
BT - 2008 IEEE International Conference on Microwaves, Communications, Antennas and Electronic Systems, COMCAS 2008
T2 - 2008 IEEE International Conference on Microwaves, Communications, Antennas and Electronic Systems, COMCAS 2008
Y2 - 13 May 2008 through 14 May 2008
ER -