Rapid thermal processing of epitaxial II-VI heterostructures

S. Stolyarova, N. Amir, Y. Nemirovsky

Research output: Contribution to journalConference articlepeer-review

Abstract

The rapid thermal processing combined with metalorganic chemical vapor deposition (RTP-MOCVD) has been applied to the growth of II-VI heterostructures of CdTe/CdZnTe, CdTe/HgCdTe and ZnTe/CdTe. It has been demonstrated that all steps of rapid thermal processing contribute to the growth of II-VI compounds: (i) Photothermal pretreatment of substrate surfaces improves the crystalline structure and morphology of the films. (ii) RTP-MOCVD process results in higher growth rates (up to 60 μm/h) compared to conventional MOCVD. (iii) Rapid thermal annealing (RTA) leads to further improvement of the epilayers crystalline structure.

Original languageEnglish
Pages (from-to)1157-1161
Number of pages5
JournalJournal of Crystal Growth
Volume198-199
Issue numberpt 2
DOIs
StatePublished - Mar 1999
EventProceedings of the 1998 10th International Conference on Vapor Growth and Epitaxy and Specialist Workshops on Crystal Growth, ICVGE-10 - Jerusalem, Isr
Duration: 26 Jul 199831 Jul 1998

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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