The influence of thermoelectric effects on the self-heating of nanometer CMOS-SOI devices

Maria Malits, Alex Svetlitza, Evgeny Manzhosov, Noa Rotman, Yael Nemirovsky

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this study we use the measured threshold voltage as the 'thermometer' to determine the true channel temperature. The self-heating effects are measured using a careful calibration of the process temperature dependent parameters such as the threshold voltage, mobility and non-ideality factor. It is shown that the temperature rise is significant, approximately 100K above room temperature, even for transistors with relatively low applied power (∼ 0.1 mWatt). The CMOS-SOI transistors were designed and fabricated using a standard partially depleted 180 nm CMOS-SOI process. The induced self-heating may result in higher device temperature than predicted by the conventional steady-state thermal analysis. Modeling based on channel's thermoelectric effects is applied to account for the observed local-heating. The results of this study have an impact on circuit design and may be extended to regular submicron CMOS technology.

Original languageEnglish
Title of host publication2012 IEEE 27th Convention of Electrical and Electronics Engineers in Israel, IEEEI 2012
DOIs
StatePublished - 2012
Event2012 IEEE 27th Convention of Electrical and Electronics Engineers in Israel, IEEEI 2012 - Eilat, Israel
Duration: 14 Nov 201217 Nov 2012

Publication series

Name2012 IEEE 27th Convention of Electrical and Electronics Engineers in Israel, IEEEI 2012

Conference

Conference2012 IEEE 27th Convention of Electrical and Electronics Engineers in Israel, IEEEI 2012
Country/TerritoryIsrael
CityEilat
Period14/11/1217/11/12

Keywords

  • Channel temperature
  • Joule heating
  • Peltier heating
  • Silicon-On-Insulator
  • thermal effects
  • threshold voltage

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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