Electrostatically driven micro resonator with a CMOS capacitive read out

Yinon Satuby; Uri Ben-Yehuda; Claudio G. Jakobson; Jacob Shneider; Dan Lavie; Yael Nemirovsky; Shmuel Kaldor; Meriam Hershkovitz; Ehud Netzer

Electrostatically driven micro resonator with a CMOS capacitive read out

Yinon Satuby, Uri Ben-Yehuda, Claudio G. Jakobson, Jacob Shneider, Dan Lavie, Yael Nemirovsky, Shmuel Kaldor, Meriam Hershkovitz, Ehud Netzer

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

An electrostaticly driven micro resonator is fabricated from single-crystal silicon, using micromachining techniques. The displacement amplitude is measured through a differential capacitance measurement, implemented on a CMOS interface circuit, which also provides the excitation clocks for the resonator. The unique feature of this micromechanical system is the integration method applied for attaching the resonator to the CMOS chip. The integration is based upon indium bumps technology, which is now established in modules of infra-red focal plane arrays. A technology which is extended here for the first time, to the best of our knowledge, to micro electro mechanical systems.

Original language	English
Title of host publication	Proceedings of the 18th Convention of Electrical and Electronics Engineers in Israel
Pages	2.5.2/1-5
State	Published - 1995
Event	Proceedings of the 18th Convention of Electrical and Electronics Engineers in Israel - Tel Aviv, Isr Duration: 7 Mar 1995 → 8 Mar 1995

Conference

Conference	Proceedings of the 18th Convention of Electrical and Electronics Engineers in Israel
City	Tel Aviv, Isr
Period	7/03/95 → 8/03/95

ASJC Scopus subject areas

General Engineering

Access to Document

https://ieeexplore.ieee.org/document/513810

Cite this

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title = "Electrostatically driven micro resonator with a CMOS capacitive read out",

abstract = "An electrostaticly driven micro resonator is fabricated from single-crystal silicon, using micromachining techniques. The displacement amplitude is measured through a differential capacitance measurement, implemented on a CMOS interface circuit, which also provides the excitation clocks for the resonator. The unique feature of this micromechanical system is the integration method applied for attaching the resonator to the CMOS chip. The integration is based upon indium bumps technology, which is now established in modules of infra-red focal plane arrays. A technology which is extended here for the first time, to the best of our knowledge, to micro electro mechanical systems.",

author = "Yinon Satuby and Uri Ben-Yehuda and Jakobson, {Claudio G.} and Jacob Shneider and Dan Lavie and Yael Nemirovsky and Shmuel Kaldor and Meriam Hershkovitz and Ehud Netzer",

year = "1995",

language = "אנגלית",

pages = "2.5.2/1--5",

booktitle = "Proceedings of the 18th Convention of Electrical and Electronics Engineers in Israel",

note = "Proceedings of the 18th Convention of Electrical and Electronics Engineers in Israel ; Conference date: 07-03-1995 Through 08-03-1995",

}

Satuby, Y, Ben-Yehuda, U, Jakobson, CG, Shneider, J, Lavie, D, Nemirovsky, Y, Kaldor, S, Hershkovitz, M & Netzer, E 1995, Electrostatically driven micro resonator with a CMOS capacitive read out. in Proceedings of the 18th Convention of Electrical and Electronics Engineers in Israel. pp. 2.5.2/1-5, Proceedings of the 18th Convention of Electrical and Electronics Engineers in Israel, Tel Aviv, Isr, 7/03/95. <https://ieeexplore.ieee.org/document/513810>

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T1 - Electrostatically driven micro resonator with a CMOS capacitive read out

AU - Satuby, Yinon

AU - Ben-Yehuda, Uri

AU - Jakobson, Claudio G.

AU - Shneider, Jacob

AU - Lavie, Dan

AU - Nemirovsky, Yael

AU - Kaldor, Shmuel

AU - Hershkovitz, Meriam

AU - Netzer, Ehud

PY - 1995

Y1 - 1995

N2 - An electrostaticly driven micro resonator is fabricated from single-crystal silicon, using micromachining techniques. The displacement amplitude is measured through a differential capacitance measurement, implemented on a CMOS interface circuit, which also provides the excitation clocks for the resonator. The unique feature of this micromechanical system is the integration method applied for attaching the resonator to the CMOS chip. The integration is based upon indium bumps technology, which is now established in modules of infra-red focal plane arrays. A technology which is extended here for the first time, to the best of our knowledge, to micro electro mechanical systems.

AB - An electrostaticly driven micro resonator is fabricated from single-crystal silicon, using micromachining techniques. The displacement amplitude is measured through a differential capacitance measurement, implemented on a CMOS interface circuit, which also provides the excitation clocks for the resonator. The unique feature of this micromechanical system is the integration method applied for attaching the resonator to the CMOS chip. The integration is based upon indium bumps technology, which is now established in modules of infra-red focal plane arrays. A technology which is extended here for the first time, to the best of our knowledge, to micro electro mechanical systems.

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Y2 - 7 March 1995 through 8 March 1995

ER -

Electrostatically driven micro resonator with a CMOS capacitive read out

Abstract

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